%0 Journal Article %T A STUDY ON ELECTRICAL RESISTIVITY OF RF SPUTTERING Pd FILMS
射频溅射Pd薄膜的电阻率研究 %A SHI YI-SHENG %A ZHAO TE-XIU %A LIU HONG-TU %A WANG XIAO-PING %A
施一生 %A 赵特秀 %A 刘洪图 %A 王晓平 %J 物理学报 %D 1990 %I %X In this paper, we report the study of the dependence of electrical resistivities of sputtering Pd films on their thicknesses and electrical resistivities of sputtering Pd films under different sputtering power. The results show that there is a small diversity between the latter theory of "size effects" and results of the thickness dependence of electrical resistivity. This diversity is due to effect of temperatures of the substrates. It shows that there is optimization during depositing on glass, and sputtering power would af fecth the electrical resistivity. After discussing the problem of substrate temperatures, we obtained a quantitative formula for the substrate temperature dependence of electrical resistivity. %K 射频溅射 %K Pd %K 薄膜 %K 电阻率 %U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=DF5F84D58C4186DEE65502461DCB8AE4&yid=8D39DA2CB9F38FD0&vid=7C3A4C1EE6A45749&iid=708DD6B15D2464E8&sid=E35B85FD10020A32&eid=A369E079A2D86222&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=2