%0 Journal Article
%T Optimization of Al2O3/SiNx stacked antireflection structures for N-type surface-passivated crystalline silicon solar cells<br>N型表面钝化晶体硅太阳电池Al2O3/SiNx减反射叠层的优化研究
%A Wu Dawei
%A Jia Rui
%A Ding Wuchang
%A Chen Chen
%A Wu Deqi
%A Chen Wei
%A Li Haofeng
%A Yue Huihui
%A Liu Xinyu
%A <br>吴大卫
%A 贾锐
%A 丁武昌
%A 陈晨
%A 武德起
%A 陈伟
%A 李昊峰
%A 岳会会
%A 刘新宇
%J 半导体学报
%D 2011
%I 
%X In the case of the N-type solar cells, the anti-reflection property, as one of the important factors to further improve the energy-conversion efficiency, has been optimized using a stacked Al2O3/SiNx layers. The effect of the layer thickness of the SiNx layer on the surface reflection property was systematically studied in terms of both experimental and theoretical measurement. In the stacked Al2O3/SiNx layers, results demonstrated that the surface reflection property can be effectively optimized when adding a SiNx layer, leading to the improvement in the final photovoltaic characteristic for the N-type solar cells.
%K antireflection coatings
%K aluminum oxide
%K silicon nitride
%K simulation
%K solar cells<br>减反射层，氧化铝，氮化硅，模拟，
%K 太阳电池
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=D52C2BA5472F4DECD6593983688C03C1&yid=9377ED8094509821&vid=9971A5E270697F23&iid=9CF7A0430CBB2DFD&sid=394CD2F50D6790D9&eid=E158A972A605785F&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=11