%0 Journal Article
%T Effect of chemical polish etching and post annealing on the performance of silicon heterojunction solar cells<br>化学抛光处理和低温退火对硅异质结太阳电池性能的影响
%A Jiang Zhenyu
%A Dou Yuhu
%A Zhang Yu
%A Zhou Yuqin
%A Liu Fengzhen
%A Zhu Meifang
%A <br>蒋振宇
%A 豆玉华
%A 张瑜
%A 周玉琴
%A 刘丰珍
%A 朱美芳
%J 半导体学报
%D 2009
%I 
%X Amorphous/crystalline silicon heterostructure solar cells have been fabricated by hot wire chemical vapor deposition (HWCVD) on textured p-type substrates. The influence of chemical polish (CP) etching and the post annealing process on the solar cell perf
%K HIT solar cells
%K chemical polishing
%K post annealing
%K HWCVD<br>异质结太阳电池，化学抛光，后退火，热丝化学气相沉积
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=C0DC770A1550E745C543D642C8FF5457&yid=DE12191FBD62783C&vid=340AC2BF8E7AB4FD&iid=5D311CA918CA9A03&sid=4B3EF36943658022&eid=94C357A881DFC066&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=8