%0 Journal Article
%T Structural and optical properties of Zn3N2 films prepared by magnetron sputtering in NH3-Ar mixture gases<br>NH3-Ar气氛下制备的Zn3N2薄膜的结构和光学性能
%A Wu Jiangyan
%A Yan Jinliang
%A Yue Wei
%A Li Ting
%A <br>吴江燕
%A 闫金良
%A 岳伟
%A 李厅
%J 半导体学报
%D 2012
%I 
%X Zinc nitride films were prepared by RF magnetron sputtering a metallic zinc target in NH3-Ar mixture gases on glass substrate at room temperature. The effects of NH3 ratio on the structural and optical properties of the films were examined. X-ray diffraction (XRD) analysis indicates that the films are polycrystalline and have a preferred orientation of (321). An indirect optical band gap increased from 2.33 to 2.70 eV when the NH3 ratio varied from 5% to 25%. The photoluminescence (PL) spectrum shows two emission peaks; the peak located at 437 nm is attributed to the incorporation of oxygen, and the other at 459 nm corresponds to the intrinsic emission.
%K zinc nitride films
%K magnetron sputtering
%K NH3 ratios
%K photoluminescence<br>Zn3N2薄膜
%K 磁控溅射
%K NH3分压
%K 光致发光
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=CEC329CE751EFFDA2550B78582C66566&yid=99E9153A83D4CB11&vid=27746BCEEE58E9DC&iid=E158A972A605785F&sid=C56EB98C670F3E37&eid=E158A972A605785F&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=7