%0 Journal Article
%T Simple General Purpose Ion Beam Deceleration System Using a Single Electrode Lens
%A J. Lopes
%A J. Rocha
%J World Journal of Engineering and Technology
%P 127-133
%@ 2331-4249
%D 2015
%I Scientific Research Publishing
%R 10.4236/wjet.2015.33014
%X Ion beam deceleration properties of a newly developed low-energy ion beam implantation system were studied. The objective of this system was to produce general purpose low-energy (5 to 15 keV) implantations with high current beam of hundreds of ¦ÌA level, providing the most wide implantation area possible and allowing continuously magnetic scanning of the beam over the sample(s). This paper describes the developed system installed in the high-current ion implanter at the Laboratory of Accelerators and Radiation Technologies of the Nuclear and Technological Cam-pus, Sacav¨¦m, Portugal (CTN).
%K Deceleration
%K Low Energy
%K Positive Ion Beam
%U http://www.scirp.org/journal/PaperInformation.aspx?PaperID=58632