%0 Journal Article
%T Plasma-Assisted Chemical Vapor Deposition of TiO<sub>2</sub> Thin Films for Highly Hydrophilic Performance
%A Satoshi Yamauchi
%A Yoh Imai
%J Crystal Structure Theory and Applications
%P 1-7
%@ 2169-2505
%D 2013
%I Scientific Research Publishing
%R 10.4236/csta.2013.21001
%X <span>Titanium-oxide layer was grown on glass substrate by plasma-assisted chemical vapor deposition (PCVD) using oxygen gas plasma excited by radio-frequency power at 13.56 MHz in the pressure as low as 3mtorr at relatively low temperature below 400<sup>o</sup>C, and studied on the crystallographic properties with the hydrophilic behavior comparing to the layer deposited by low-pressure chemical vapor deposition (LPCVD). Raman spectra indicated anatase-phase TiO<sub>2</sub> layer without amorphous-phase could be formed above 340<sup>o</sup>C by simultaneous supply of plasma-cracked and non-cracked titanium-tetra-iso-propoxide (TTIP) used as preliminary precursor. Surface Scanning Electron Microscope images indicated the PCVD-layer consists of distinct nanometer-size plate-like columnar grains, in contrast to rugged micrometer-size grains in the LPCVD-layer. Extremely small water contact angle about 5<sup>o</sup> in dark and the quick conversion to super-hydrophilicity by UV-irradiation with a light-power density as low as 50</span><span> </span><span>W/cm<sup>2</sup> were observed on the PCVD-</span><span> </span><span>layer grown at 380<sup>o</sup>C, while the large initial contact angle was above 40<sup>o</sup> and the response for the UV-irradiation was gradual on the LPCVD-layer.</span><span></span>
%K PCVD
%K Titanium-Oxide Films
%K Anatase-TiO&lt
%K sub&gt
%K 2&lt
%K /sub&gt
%K Hydrophilicity
%U http://www.scirp.org/journal/PaperInformation.aspx?PaperID=29437