%0 Journal Article
%T DEPENDENCE OF ADHESION OF FILMS OF TELLURIDE UPON ITS MI CROSTRUCTURE<br>碲化物薄膜的附着牢固度与其显微结构的关系
%A ZHANG Su-Ying
%A FAN Bin
%A CHENG Shi-Ping
%A LIN Jie-Hu
%A ZHOU Shi-Yao
%A WANG Ge-Y
%A SHI Tian-Shen
%A <br>张素英
%A 程实平
%J 红外与毫米波学报
%D 1999
%I Science Press
%X Microstructures of single layer of telluride and telluride/ZnS multilayer on Si and Ge substrates were investigated by XRD and TEM. The correlation between adhesion and microstructure of layers was given.
%K telluride
%K film
%K microstructure
%K adhesion<br>碲化物
%K 薄膜
%K 显微结构
%K 附着牢固度
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=D3B4F771D1A06062008B4D0A2EF05996&aid=A88E07A75FAFEA3F&yid=B914830F5B1D1078&vid=13553B2D12F347E8&iid=E158A972A605785F&sid=170CE8B011EA4FD9&eid=717CC18E05F2AFA0&journal_id=1001-9014&journal_name=红外与毫米波学报&referenced_num=2&reference_num=1