%0 Journal Article
%T MICROSTRUCTURE AND OPTICAL PROPERTIES OF THE AIN FILMS DEPOSITED BY ION BEAM ENHANCED REACTIVE MAGNETRON SPUTTERING<br>离子束增强反应磁控溅射AIN膜的组织结构及光学特性
%A WANG Hao
%A HUANG Rongfang
%A HONG Ruijiang
%A WU Jie
%A WEN Lishi
%A <br>王浩
%A 黄荣芳
%A 洪瑞江
%A 吴杰
%A 闻立时
%J 材料研究学报
%D 1992
%I 
%X Microstructure,crystallography,electron structure and optical properties ofaluminum nitride film deposited by ion beam enhanced reactive magnetron sputtering were stu-died.The results show that the microstructure of the film is uniform and the grain size
%K thin films
%K AIN
%K magnetron sputtering<br>薄膜
%K AlN
%K 磁控溅射
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=BFF0829C47876DA2&yid=F53A2717BDB04D52&vid=B31275AF3241DB2D&iid=38B194292C032A66&sid=FBCA02DBD05BD4EA&eid=C812B90E96151014&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=1&reference_num=1