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Hardness and stress of amorphous carbon films deposited by glow discharge and ion beam assisting deposition
Marques, F. C.;Lacerda, R. G.;
Brazilian Journal of Physics , 2000, DOI: 10.1590/S0103-97332000000300008
Abstract: the hardness and stress of amorphous carbon films prepared by glow discharge and by ion beam assisting deposition are investigated. relatively hard and almost stress free amorphous carbon films were deposited by the glow discharge technique. on the other hand, by using the ion beam assisting deposition, hard films were also obtained with a stress of the same order of those found in tetrahedral amorphous carbon films. a structural analysis indicates that all films are composed of a sp2-rich network. these results contradict the currently accepted concept that both stress and hardness are only related to the concentration of sp3 sites. furthermore, the same results also indicate that the sp2 sites may also contribute to the hardness of the films.
Hardness and stress of amorphous carbon films deposited by glow discharge and ion beam assisting deposition  [cached]
Marques F. C.,Lacerda R. G.
Brazilian Journal of Physics , 2000,
Abstract: The hardness and stress of amorphous carbon films prepared by glow discharge and by ion beam assisting deposition are investigated. Relatively hard and almost stress free amorphous carbon films were deposited by the glow discharge technique. On the other hand, by using the ion beam assisting deposition, hard films were also obtained with a stress of the same order of those found in tetrahedral amorphous carbon films. A structural analysis indicates that all films are composed of a sp2-rich network. These results contradict the currently accepted concept that both stress and hardness are only related to the concentration of sp3 sites. Furthermore, the same results also indicate that the sp2 sites may also contribute to the hardness of the films.
Depth Profiles of Absorbed Hydrogen in Ni-Nb-Zr Amorphous Alloy Ribbons by Glow Discharge Optical Emission Spectroscopy  [PDF]
Rie Y. Umetsu, Mikiko Saito, Toshio Sasaki, Tetsushi Sekiguchi, Jun Mizuno, Hiroshi Kawarada
Open Journal of Metal (OJMetal) , 2014, DOI: 10.4236/ojmetal.2014.44013
Abstract: Depth profiles of absorbed hydrogen introduced by electrochemical charging and light elements were analyzed in Ni-Nb-Zr-H amorphous alloy ribbons using a glow discharge optical emission spectrometer. It was clarified that the absorbed hydrogen was comparatively well-distributed on the sample surface and that the content of the hydrogen decreased with increasing depth from the surface. That is, the amount of absorbed hydrogen on the surface was about 17 at %, while that inside the specimens decreased to several atomic percent. The depth profiles of the hydrogen which were close to the surface were slightly different between those on the roller side and those on the free side in the melt-spun ribbon. The difference is thought to originate from the existence of oxygen impurity on the surface and from the difference of the Zr content.
Plasma-Based Graphene Functionalization in Glow Discharge  [PDF]
X. Fang, J. Donahue, A. Shashurin, M. Keidar
Graphene (Graphene) , 2015, DOI: 10.4236/graphene.2015.41001
Abstract:
Glow discharge was utilized to add oxygen functional groups to the graphene platelets sample produced in chemical exfoliation synthesis. It was concluded based on Raman spectra that the graphene sample treated with the glow discharge preserves specific graphene features while no transformation to amorphous carbon is happening. SEM and EDS results indicated the increases of oxygen content in the graphene sample after the exposure to the glow discharge. Raman spectra also support the fact that the graphene platelets have been decorated with oxygen as the result of the glow discharge treatment.
Bandgap Alteration of Transparent Zinc Oxide Thin Film with Mg Dopant
M. Salina,R. Ahmad,A. B. Suriani,M. Rusop
Transactions on Electrical and Electronic Materials , 2012,
Abstract: We have successfully demonstrated a bandgap alteration of transparent zinc oxide (ZnO) thin film with Mg dopantby using sol-gel spin coating technique. By increasing the dopant from 0 to 30 atomic percent (at.%), a decrementvalue in the cutoff is observed, where the absorption edge shifts continuously to the shorter wavelength side, towards300 nm. This resulted in a significant bandgap increment from 3.28 to 3.57 eV. However, the transmittance of the thinfilm at 350-800 nm gradually downgraded, from 93 to 80 % which is most probably due to the grain size that becomesbigger, and it also affected the electrical properties. The decrement from 45 to 0.05 mA at +10 V was observed in theI-V characteristics, concluding the significant relationship; where higher optical bandgap materials will exhibit lowerconductivity. These findings may be useful in optoelectronics devices.
Emergence of the stochastic resonance in glow discharge plasma  [PDF]
Md Nurujjaman,A N Sekar Iyengar,P Parmananda
Physics , 2009, DOI: 10.1088/1742-6596/208/1/012084
Abstract: stochastic resonance, glow discharge plasma, excitable medium, absolute mean difference
Effect of Waveform Parameters on Pulsed Glow Discharge in Air  [PDF]
Fengbo Tao, Zhicheng Zhou, Yong Ma, Qiaogen Zhang
Journal of Modern Physics (JMP) , 2012, DOI: 10.4236/jmp.2012.330207
Abstract: The nanosecond single pulse was employed here to generate a large volume glow discharge between the wire-plane electrodes in air. In order to find requirements on pulse waveform for generation of a large volume discharge at atmospheric pressure, the effect of pulse risetime, pulse width, and amplitude on glow discharge has been widely investigated in this paper. Results reveal that a large volume glow discharge can be generated in an inhomogeneous electric field under the single pulse with the faster risetime, the lower peak amplitude. The pulse width has almost no influence on the density of glow discharge, but which has a great influence on the transition from glow discharge to streamer discharge. A model of inter-shielding-effect has been proposed to explain the influence of waveform parameters on pulsed glow discharge.
OBSERVATION ON SPUTTERING SURFACE OF ALLOYS IN GLOW DISCHARGE

REN Jianshi,ZHAO Huilin,ZHANG Gongshu Institute of Metal Research,Academia Sinica,Shenyang,

金属学报 , 1989,
Abstract: Glow discharge cathodic sputtering of alloys containing second phase precipitatesor injection of oxide particles has been observed with an energy dispersive X-ray spectrometerand scanning electron microprobe. It was shown that the formation of cones during thesputtering in these alloys is due to masking of the matrix by glow sputtering second phaseprecipitates or oxide particles. At steady state, the number density was lound to be a functionof precipitate or oxide particle density in bulk alloys. In addition to local sputtering rate changes,the electrostate effect ?ay play a role in the formation of cones.
OBSERVATION ON SPUTTERING SURFACE OF ALLOYS IN GLOW DISCHARGE
REN Jianshi ZHAO Huilin ZHANG Gongshu Institute of Metal Research,Academia SinicaShenyang,China ZHANG Gongshu,Senior Engineer,
REN Jianshi ZHAO Huilin ZHANG Gongshu Institute of Metal Research
,Academia Sinica.Shenyang,China ZHANG Gongshu,Senior Engineer,Institute of Metal Research,Academia Sinica,Shenyang,China

金属学报(英文版) , 1990,
Abstract: Glow discharge cathodic sputtering of alloys containing second phase precipitates or injected oxide particles has been observed with energy dispersive X-ray spectrometer and scanning electron microprobe.It was shown that the formation of cones during the sputtering in these alloys is due to masking of the matrix by glow sputtering second phase precipitates or oxide particles.At steady state,the density of cottes were found to be a function of the densities pre- cipitates or oxide particles in bulk alloy.In addition to the changes of local sputtering rate,the electrostatic effect may play a role on the formation fo cones.
The Fractal Dimension of Ionization Cascades in the Glow Discharge  [PDF]
Reginald Smith
Physics , 2004, DOI: 10.1088/0022-3727/38/7/008
Abstract: The glow discharge's main ionization breakdown processes have been understood for about one hundred years. The glow discharge, however, still remains an area of active research in relation to pattern formation and far-from-equilibrium systems. The primary and secondary ionization processes can be mathematically modelled as general branching processes. Not only is the Townsend breakdown criterion obtained but the ionization avalanche can be characterized as a branching set with a unique Hausdorff fractal dimension. These fractal dimensions can be utilized in applications using similarity principles and Paschen's Law.
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