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Crystallization and Amorphization of Cristobalite
方石英的析晶与无定形化

XU Chang-Ming,WANG Shi-Wei,HUANG Xiao-Xian,GUO Jing-Kun,ZHOU Guo-Hong,
徐常明 王士维
,黄校先,郭景坤,周国红

无机材料学报 , 2007,
Abstract: Silica is an important structural and functional material, which is widely applied in the fields of aero craft, semiconductor, electronic telecommunication, and optical devices. However, the crystallization of cristobalite at elevated temperature has restricted its further application. In the present paper, current research results on the crystallization behavior of cristobalite in silica with different morphologies (bulk, powder, fiber and gel) and different silica matrix composites and different opinions on the mechanism of the crystallization behavior were reviewed. The mechanism of the crystallization behavior was recognized by the surface crystallization in the paper. In addition, the latest research results on the amorphization of cristobalite were also introduced.
THE ROLE OF INTERNAL STRESS IN THE AMORPHIZATION PROCESS DURING MECHANICAL ALLOYING
机械合金化非晶化过程中内应力的作用

MIAO WEI-FANG,LI GU-SONG,LI SHU-LING,WANG JING-TANG,
苗卫方
,李谷松,李淑苓,王景唐

物理学报 , 1992,
Abstract: The characteristics of amorphization process during mechanical alloying of the mixture of Ni and Zr powders have been studied by differential scanning calorimetry (DSC) and X-ray diffraction measurements. The role of internal stress in the amorphization process, together with the variation in internal stress are discussed.
解放後的前中央研究院化學究研所  [PDF]
徐曉白
科学通报 , 1950,
Abstract: 解放大軍神速地解放了上海,不但使化學研究所的工作人員緊張和悵惘的心情安定了下來;而且順利地將二十多年來辛苦經營的一切圖書儀器交給了人民。這給新中國的科學事業和化學研究所的發展開闢了光輝的道路。
HYDROGEN INDUCING AMORPHIZATION OF Ti-Fe SYSTEM IN MECHANICAL ALLOYING
Ti—Fe机械合金化中氢致非晶化的研究

REN Shan,HONG Lan,ZHANG Jinxiu LU Manqi,HU Zhuangqi,
任山
,洪澜,张进修,吕曼祺,胡壮麒

金属学报 , 1998,
Abstract: The solid reactions and structures of Ti Fe and Ti Fe TiH2 during mechanical alloying were studied by using XRD, DSC etc. The results show that hydrogen can induce amorphization of TiFe in MA. The characteristic temperatures of amorphous TiFe(H) phase, such as structure relaxation and crystallization temperatures, are lower than that of the amorphousTiFe phase synthesized by mechanical alloying.
AMORPHIZATION REACTION PROCESS IN Ni/AMORPHOUS Si MULTILAYER
Ni/a-Si多层膜中固相非晶化反应过程

WANG WEI-HUA,BAI HAI-YANG,WANG WEN-KUI,
汪卫华
,白海洋,王文魁

物理学报 , 1998,
Abstract: Solid state amorphization reaction process in Ni/amorphous Si multilayers has been quanlitatively studied by using in situ X-ray diffraction. An amorphous formation and growth model is suggested for elucidating the solid state reaction in the Ni/amorphous Si multilayers. Thermodynamic and kinetic interpretations for the amorphization reaction at grain boundaries in Ni sublayers are presented.
SOLID STATE AMORPHIZATION REACTION IN BINARY ALLOY MULTILAYERS
二元合金多层膜中的固态反应非晶化

YAN ZHI-HUA,CHEN HONG,WANG WEN-KUI,
严志华
,陈红,王文魁

物理学报 , 1990,
Abstract: In this paper, we report the amorphization observed in Fe-Ti and Fe-Si systems through a solid state reaction at low temperatures, and confirm the formation of amorphous Ni-Ti alloy after reaction. This new amorphization processes can be considered as the result from competing amorphous phase with crystalline phase in kinetics. A kinetical criterion for forming amorphous phase by solid state reaction is discussed in detail.
解放後的前中央研究院化學究研所
徐曉白
科学通报 , 1950,
Abstract: 解放大軍神速地解放了上海,不但使化學研究所的工作人員緊張和悵惘的心情安定了下來;而且順利地將二十多年來辛苦經營的一切圖書儀器交給了人民。這給新中國的科學事業和化學研究所的發展開闢了光輝的道路。 這偉大的車轉變,將研究人員從在實驗室埋頭苦幹只作純粹學理研究的小圈子中解放了出來,從一九二八年這個研究所創設以來,雖然中間經歷了許多困難和重大的事件,如抗戰時遷昆,勝
Investigation of Tungsten Silicide Formation and Its Structural and Electrical Properties
二硅化钨形成、结构和电性质的研究

Ding Xunliang/Institute of Low Energy Nuclear Physics,Beijing Normal University,Beijing,ChinaWang Zhonglie/Institute of Low Energy Nuclear Physics,Beijing Normal University,Beijing,ChinaQian Yahong/Institute of Low Energy Nuclear Physics,Beijing Normal University,Beijing,China,
丁训良
,王忠烈,钱亚宏

半导体学报 , 1988,
Abstract: WSi_2 film has been successfully formed by As ion beam mixing.The factors afeectingthe structural and electrical properties of ion beam induced WSi_2 film have ben studied bymeans of Rutherford Backscatering Spectroscopy (RBS), ~(16)O(a, a)~(16)O resonance scattering, X-ray diffraction (XRD), transmission electron microscopy (TEM) and four-probe resistance me-asurement. The formation temperature of the refractory tungsten silicide can be significantlyreduced by some elevation of substrate temperature during implantation.The change in theresistivity of the film by annealing is related to microstructure.The incorporation of oxygenimpurity during deposition can greatly affect the resistivity of the resulting silicide film.Theoxygen impurity present in the films limits the grain growth and leads to smaller grain andhigher resistivity.The redistributions of oxygen and implanted As ion during annealing wereobserved.A significant portion of implanted As is lost from the surface after annealing athigher temperature.Finally, the mechanism of the silicide formation by ion beam mixing isdiscussed.
无 氧 条 件 下TiO2 薄 膜 界 面 光 催 化 反 应 的XPS 研 究  [PDF]
杨喜昆,胡显智,何 兵,楚国栋
分子催化 , 2009,
Abstract: 设 计 利 用 X 射 线 光 电 子 能 谱 仪 的 高 真 空 系 统 作 为 无 氧 条 件 下 光 催 化 反 应 和 分 析 的 场 所 , 研 究 真 空 无 氧 环 境 和 大 气 有 氧 环 境 中 紫 外 光 激 发 TiO2 薄 膜 表 面 的 光 催 化 反 应 , 并 对 无 氧 条 件 下 TiO2 薄 膜 降 解 亚 甲 基 蓝 进 行 初 步 探 索 . 结 果 表 明 , 在 大 气 有 氧 和 真 空 无 氧 条 件 下 TiO2 薄 膜 经 紫 外 光 照 后 , 表 面 的 化 学 组 成 和 化 学 状 态 均 发 生 了 变 化 ; 在 有 氧 环 境 中 TiO2 薄 膜 表 面 氧 含 量 增 加 , 而 在 无 氧 环 境 中 TiO2 薄 膜 表 面 氧 含 量 减 少 . TiO2 薄 膜 表 面 的 吸 附 氧 是 维 持 无 氧 条 件 下 光 催 化 反 应 的 重 要 原 因 , 增 加 薄 膜 表 面 吸 附 氧 的 含 量 能 提 高 TiO2 薄 膜 在 无 氧 环 境 中 的 催 化 活 性 . 此 外 , 无 氧 条 件 下 TiO2 薄 膜 降 解 亚 甲 基 蓝 光 催 化 反 应 过 程 中 , 亚 甲 基 蓝 分 子 只 是 脱 去 了 某 个 含 氮 的 基 团 , 生 成 了 中 间 产 物 , 而 并 没 有 完 全 降 解 .
THERMODYNAMIC AND KINETIC ASPECTS OF SOLID STATE AMORPHIZATION REACTION IN Ni/a-Si MULTILAYER SYSTEM
Ni-Si多层膜中固态非晶化反应的热力学与动力学过程

WANG WEI-HUA,BAI HAI-YANG,ZHANG YUN,CHEN HONG,WANG WEN-KUI,
汪卫华
,白海洋,张云,陈红,王文魁

物理学报 , 1993,
Abstract: The interfacial solid state reaction was studied in the Ni/a-Si multilayer. The thermody-namic and kinetic aspects of the solid state amorphization was explained according to the calculated metastable free energy diagram. A kinetic reaction model for the solid state amorphization reaction of Ni/a-Si multilayers is developed.
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