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离子束溅射制备zno:zn荧光薄膜

Keywords: zno:zn,荧光薄膜,热处理,光致发光

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Abstract:

?用离子束溅射法制备了用于场发射显示器(fed)的zno:zn荧光薄膜.采用rbs、xrd、afm、hall和pl谱等手段表征了热处理前后的薄膜.rbs结果表明薄膜中存在一定数量的过量zn.沉积态的薄膜中同时含有非晶相和晶相,其表面形貌表现出多种结构.hall检测发现,升高热处理温度能降低薄膜中的自由载流子浓度,说明过量zn含量的下降;当热处理温度超过400℃时,hall迁移率迅速上升,表明薄膜结晶性能的改善.在zno:zn薄膜的pl谱中检测到紫外/紫光、蓝/绿光两组荧光峰,一价氧空位(v?o)充当了蓝/绿光的发光中心.薄膜的光致发光强度受热处理温度的影响很大,可能的原因包括薄膜结构缺陷的修复、成分均匀化和过量zn的蒸发,但这些效应在不同温度范围的作用程度各不相同.

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