%0 Journal Article
%T Aluminum Doped ZnO Thin Films Using Chemical Spray Pyrolysis
%A Ramakrishnan Jayakrishnan
%J Open Access Library Journal
%V 2
%N 12
%P 1-10
%@ 2333-9721
%D 2015
%I Open Access Library
%R 10.4236/oalib.1102108
%X Aluminum doped ZnO thin films were grown using chemical spray pyrolysis.
The doped films showed only blue and UV photoluminescence at room temperature.
The position of the near band edge emission was found to agree with the
theoretical value of ZnO nanocrystal band gap. The full width at half maximum
for the near band edge emission at room temperature was found to be ~ 100 meV,
which indicated films to be of very good device quality. The presence of a weak
photoluminescence at 3.08 �� 0.02 eV in the films was assigned to defect related
emission. We had shown in this report that it was possible to increase the
efficiency of the photoluminescence by increasing the substrate temperature
used for film growth. The optimized films showed resistivity of 1.5 �� 10<sup>��2</sup>&nbsp;����cm.
%K Thin films
%K Chemical Spray Pyrolysis
%K ZnO
%K Photoluminescence
%K Excitons
%U http://www.oalib.com/paper/3152451